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COMPONENT COMPOSITION MEASURING SYSTEM AND COMPONENT COMPOSITION MEASURING METHOD

Foreign code F180009435
File No. S2016-0669-C0
Posted date Jul 23, 2018
Country WIPO
International application number 2017JP018180
International publication number WO 2017199904
Date of international filing May 15, 2017
Date of international publication Nov 23, 2017
Priority data
  • P2016-099035 (May 17, 2016) JP
Title COMPONENT COMPOSITION MEASURING SYSTEM AND COMPONENT COMPOSITION MEASURING METHOD
Abstract This component composition measuring system is provided with: a first laser light source which radiates first laser light (L1), having an intensity sufficient to generate plasma, onto an object to be measured; a second laser light source which radiates second laser light (L2), having an intensity not sufficient to generate plasma, onto the object to be measured; a spectrum measuring device which measures a light-emission spectrum indicating the intensity at each wavelength, from plasma emissions generated by radiating the first laser light onto the object to be measured; and a control device which uses data relating to the measured light-emission spectrum to analyze the composition of the object to be measured. The second laser light source starts radiating the second laser light (L2) before the start of radiation of the first laser light (L1), and stops radiating the second laser light (L2) after radiation of the first laser light (L1) has stopped.
Scope of claims [claim1]
1. The degree of strength to generate a plasma having a first laser light is irradiated to a measurement object to a 1 1 of the first laser light source, the extent of not to generate a plasma of 2 and has a first laser light irradiated to the objects of measurement of the first laser light source and 2, wherein the first of the objects of measurement from a laser light source 1 to 1 of the second laser light from the light emission of the plasma generated by the irradiation of, the light emission spectrum intensity of each wavelength measured and spectral measurement device, measured using the data of the light-emitting spectrum analysis of a composition of the objects of measurement and control device, and, wherein the first laser light source 2, wherein the first prior to the start of irradiation of the laser beam 1, wherein the first start of irradiation of the laser beam 2, wherein the first irradiation of the laser beam after the end of 1, 2 first terminates the irradiation of the laser beam, according to the chemical composition measurement system.
[claim2]
2. 1 Said first 2 and second laser light of the laser light of the optical axis thereof is matched to the objects of measurement so as to be irradiated to, 1 wherein the first and the second optical axis of the laser light source 2 is adjusted, according to the chemical composition according to claim 1 measurement system.
[claim3]
3. Wherein said control device, and wherein the determination of the property of the light emission spectrum, wherein the predetermined state properties using only the data of the light emission spectrum of analyzing the composition of the objects of measurement, the measurement system according to claim 1 component composition.
[claim4]
4. Wherein said control device, wherein the determining the temperature of the plasma from the emission spectrum, light-emitting spectrum is greater than a predetermined temperature is a temperature of the plasma using of analyzing the composition of the objects of measurement, the measurement system according to the chemical composition according to claim 3.
[claim5]
5. Wherein said control device, wherein the emission spectrum of the determined signal strength, the signal strength is greater than a specific value of the emission spectrum of the measurement target using the data to the analysis of a composition, according to the chemical composition according to claim 3 measurement system.
[claim6]
6. Wherein said control device, the light emission spectrum measured a plurality of times, a plurality of light emitting data of the spectrum using the integration result of analyzing the composition of the objects of measurement, the measurement system according to the chemical composition according to claim 3.
[claim7]
7. A three-dimensional shape of the measurement target and measuring a distance between the three-dimensional shape measurement device, wherein the first of the objects of measurement from a laser light source 1 to adjust the focal length of the light emitted by the laser and the focal adjustment further comprises means, wherein said control device, wherein the three-dimensional shape measuring apparatus based on the result of measurement by controlling the focus adjustment unit, adjusting a focal length of the laser light, according to the chemical composition according to any one of claims 1-6 measurement system.
[claim8]
8. A three-dimensional shape of the measurement target and measuring a distance between the three-dimensional shape measurement device, wherein the objects of measurement of the laser beam is irradiated on the irradiation position changing means to adjust the position, further comprising, wherein said control device, wherein the three-dimensional shape measuring apparatus based on the measurement result by the irradiation position changing means is controlled to, the objects of measurement to adjust the position of laser light irradiated on the, according to the chemical composition according to any one of claims 1-6 measurement system.
[claim9]
9. The degree of strength to generate a plasma having a first laser light to be projected to the measurement target of the 1 step, the extent of not to generate a plasma having a first intensity of the laser light to the objects of measurement 2 and irradiating the semiconductor photocatalyst, wherein the first of the objects of measurement 1 of the laser light to the light emission from the plasma generated by the irradiation of, for each of the wavelengths to measure the emission spectrum indicative of the intensity of the steps of, light-emitting spectrum is measured using the data of the step of analyzing the composition of the objects of measurement, and, wherein prior to the start of irradiation of the laser beam 1, and 2 of the first laser irradiation is started, the first irradiation of the laser beam after the end of the 1, 2 of the first and ends the irradiation of the laser light, according to the chemical composition measurement method.
[claim10]
10. Wherein in the step of analyzing, wherein the determination of the property of the light emission spectrum, wherein the predetermined state properties using only the data of the emission spectrum of the measurement target to the analysis of a composition, the method for measuring according to the chemical composition according to claim 9.
  • Applicant
  • ※All designated countries except for US in the data before July 2012
  • TOKUSHIMA UNIVERSITY
  • Inventor
  • DEGUCHI YOSHIHIRO
  • SHIOU FANG-JUNG
IPC(International Patent Classification)
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