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Production method and production device for nitrogen compound NEW コモンズ

外国特許コード F180009473
整理番号 2016002314
掲載日 2018年9月14日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2016JP082629
国際公開番号 WO2017078082
国際出願日 平成28年11月2日(2016.11.2)
国際公開日 平成29年5月11日(2017.5.11)
優先権データ
  • 特願2015-216552 (2015.11.4) JP
発明の名称 (英語) Production method and production device for nitrogen compound NEW コモンズ
発明の概要(英語) The present invention provides a method and a device which produce a nitrogen compound membrane by plasma without applying a voltage to a substrate and without the need of a large container, suitable for an increase in area, and employing a high-pressure process which uses little power. In the production of a nitrogen compound where microwave plasma is generated to produce the nitrogen compound, by applying the microwaves to a feedstock gas containing a nitrogen-based gas which is discharged from a nozzle to the surface of a substrate at a controlled rate, the plasma containing a nitrogen-based active species generated from the feedstock gas is emitted to the surface of the substrate. In this step, the pressure is set higher than a pressure at which the mean free path of ions of the plasma is smaller than the Debye length.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
  • 発明者(英語)
  • ITAGAKI Hirotomo
  • SAKAKITA Hajime
  • KIM Jaeho
  • OGURA Mutsuo
  • WANG Xuelun
  • HIROSE Shingo
国際特許分類(IPC)
参考情報 (研究プロジェクト等) Innovative Plasma Processing Group, AIST

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