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Microwave plasma processing unit NEW コモンズ

外国特許コード F180009575
整理番号 2017000348
掲載日 2018年11月5日
出願国 大韓民国
出願番号 20177026506
公報番号 20170118867
出願日 平成28年2月22日(2016.2.22)
公報発行日 平成29年10月25日(2017.10.25)
国際出願番号 JP2016055064
国際公開番号 WO2016136669
国際出願日 平成28年2月22日(2016.2.22)
国際公開日 平成28年9月1日(2016.9.1)
優先権データ
  • 特願2015-038677 (2015.2.27) JP
  • 2016JP55064 (2016.2.22) WO
発明の名称 (英語) Microwave plasma processing unit NEW コモンズ
発明の概要(英語) [Problem] To provide a microwave plasma treatment apparatus that is not provided with complicated, long gas flow paths inside a dielectric substrate, to stabilize generation and retention of a plasma, and can generate a highly uniform, high-density, stable low-temperature plasma not only at low atmospheric pressures but also at middle atmospheric pressures and high atmospheric pressures. [Solution] In a micro plasma treatment apparatus including a dielectric substrate, a microwave introducing section, a microstrip line, an earth conductor, a gas inlet, a plasma generating section, and a nozzle for blowing out a plasma, the gas inlet is provided at the earth conductor or the microstrip line, and the gas inlet is provided with a diameter preferably smaller than a cut-off wavelength determined depending on a cross-section of the gas inlet, to prevent leakage of a microwave.
(From EP3264866 A1)
従来技術、競合技術の概要(英語) Background Art
Recent times, is in the material development or industrial technology and from much field the plasma control technique is becoming as indispensable.The plasma has high non-heat balance, will be able to create the radical of high density to the low temperature dry process technique which is widely used.
The low pressure (below 1torr) and intermediate atmospheric pressure (1torr-100torr) from is under pressure between of atmospheric pressure and plasma circle as one the plasma jet is used.The plasma jet from the nozzle of the equipment chwi will dance a plasma, does, to the pitcher board wafer, CVD which used a plasma (chemical weather synthesis), the etching, child Singh (resist pictures control), plasma nitrification, and air purity and pasteurizationControl sterilization the low of conducting is the useful thing.
Currently, in order to create the plasma jet, direct current arc discharge or direct current pulse discharge as for under using the method known well.But, direct current arc discharge or direct current pulse discharge as for under using the method, the electrode deteriorating, easy point, has many kind problem will not be able to use the reactivity gas.
Also, dielectric barrier discharge as for under using the method known well.But, dielectric barrier discharge as for under using from method, on the filament the discharge as for under occurring has many problem there is not a possibility of doing the radical creation of point and high density.
Also, also the plasma jet creation equipment of wireless pole method known.For example, VHF versus (30-300MHz) the inductive coupling style thermal plasma occurrence equipment which used the high frequency is proposed, (patent literature 1 reference).But, as for the plasma jet creation equipment which is proposed the point which is not the possibility the impedance matching large scale with problem of the complicated point and structure state, also use the electrical circuit of high voltage to on the production of the equipment and the drive to be, has many limit and a problem.
Meantime, when microwave about under using creates the plasma jet, there is a following advantage.
(1) microwave all are cheap.
(2) wireless pole drive are possible, and the discharge maintenance life is long.
(3) impedance matching are possible with the simple element.
The coupling efficiency of (4) microwave and plasma is good.
The radiation loss at (5) outside will be few, will be able to concentrate a power to the necessary place.
(6) atmospheric pressures about under including there is in a wide pressure scope and the high-density plasma which is stabilized creates.
However, from the plasma occurrence equipment which used a hitherto microwave power as the microwave transmission railway line to use the metal official seal wave guide, and the structure of microwave transmission circuit to be large and also reaching the high price has the problem the drive by that power is difficult.
To recently, instead of the hitherto wave guide, the micro strip railway line which is a small power microwave transmission railway line as for under producing the method is being proposed the plasma jet creation system about under using, (patent literature 2 and 3 and non-patent literature 1 and 2 references).
Also to 15, shows also the strabismus of example of the plasma jet creation equipment which used the hitherto micro strip railway line.This equipment, end of the one side of dielectric board (1) section (section) in the microwave which is established input department (13) and dielectric board (1) is different, side toward an end chamfer the gas euro which is established to the inside of (14) and dielectric board (1) is formed (23), the microwave power transmission suspicion micro strip which is established to one side side of dielectric board (1) the earth which one side railway line (11) and dielectric board (1) is different, side covers conductor with (12) and corresponding micro strip railway line (11) the plasma occurrence department which to between corresponding earth conductor (12) established (25), and plasma discharge the nozzle which makes (24) With is composed.
When will be in the corresponding plasma jet creation equipment, and the gas will be input, gas input 2 established to the side of board (1) of the dielectric nine (22 and 22) from the gas euro (23 and 23) will lead, plasma occurrence department (25) from will be confluence, the nozzle of width 10mm (24) from chwi will dance the outside of dielectric board (1).
Microwave (2.45GHz) power to lead the same axle (the same axle) microwave neck thu (31) big, within dielectric board (1) be introduced, about under the whole between of micro strip railway line (11) and earth conductor (12) (; propagate), plasma creation department (concentrated to 25) parts.By this, the plasma about under occurring, the gas type with the nozzle (24) from chwi will dance the outside of dielectric board (1).
Meantime, there is in a plasma process and in order to increase a productivity, the plasma control possible in meet be, the development of the plasma jet which has a wide width is strongly requested.As for the plasma occurrence equipment which used the micro strip railway line of preceding descriptions, the structure state and the dielectric borad, earth conductor about under sharing with the array box big painter possible is (patent literature 2 reference), the prospect is being expected the micro strip railway line.
Citation List
Patent literature
Japan special dog 2003-109795 public information
Japan special dog 2007-299720 public information
Japan special dog 2008-282784 public information
Non patent literature
Susanne Schemer and et. aluminum., "An improved microstrip plasma for optical emission spectrometry of gaseous species", Spectrochimica Acta Part B: Atomic Spectroscopy, Vol.56 and pp. 1585-1596 (2003).
Jaeho Kim and et. aluminum., "Microwave-excited atmospheric-pressure plasma jets using a microstrip line", Applied Physics Letters and Vol.93, 191505(2008).
特許請求の範囲(英語) [claim1]
1. With dielectric borad,
With the surface of the minute description dielectric board while be if, end of the one side of the 1st side which is from is different, side extends the micro strip railway line which is established to end,
With the minute description 1st side of the minute description dielectric board from end of the one side of the 2nd side of opposite side is different, side extends the earth conductor which is established to end,
Was established to end of the one side of the minute description dielectric borad, with the minute description micro strip railway line inputs the microwave with to between the minute description earth conductor the microwave input department for and,
From minute description microwave input department by the microwave which is input plasma at the time of occurrence height is a space for, also, with the minute description micro strip railway line with to between the minute description earth conductor is established the plasma occurrence department which a space where is and,
Was established to the minute description earth conductor or the minute description micro strip railway line, supplies the gas to minute description plasma occurrence department the gas input nine for and,
By the gas and the microwave which are supplied to minute description plasma occurrence department as for under occurring plasma, the minute description dielectric board is different, side from end discharge height the nozzle for as for under having the microwave plasma processing unit thing with feature.
[claim2]
2. There is in a 1st clause,
The diameter of minute description gas input nine, by the section of minute description gas input nine than the interception wavelength which is fixed is small, the microwave plasma processing unit.
[claim3]
3. 1st clause or there is in a 2nd clause,
The 1st side of the minute description dielectric board or to the 2nd side, the minute description micro strip railway line or the minute description earth conductor petal, the home impaction as for under having the microwave plasma processing unit thing with feature.
[claim4]
4. 1st clause to there is in which one clause in 3rd clause,
The minute description dielectric borad, the minute description dielectric board is different and side toward an end the chamfer of the form where the thickness becomes small slowly as for under having the microwave plasma processing unit thing with feature.
[claim5]
5. 1st clause to there is in which one clause in 4th clause,
Establishes the gas input nine more than 2 to the minute description earth conductor, or the minute description micro strip railway line the different gas kind supplies to respectively gas input nine with, changes a plasma discharge quality and a plasma control quality the microwave plasma processing unit the fact that with feature.
[claim6]
6. There is in a 5th clause,
Establishes the gas input nine more than 2 to the minute description earth conductor, or the minute description micro strip railway line to which gas input nine evaporation supply means of the fluid material as for under having the microwave plasma processing unit thing with feature.
[claim7]
7. 1st clause to there is in which one clause in 6th clause,
Comes in contact to the side where the minute description micro strip railway line is established to the minute description dielectric board and with the 2nd dielectric board which is established,
From end of the one side of the minute description 2nd dielectric board is different, side extends the 2nd earth conductor which is established to end,
With the minute description micro strip railway line the 2nd plasma occurrence department which is a space where with to between the minute description 2nd earth conductor is established and,
In order to supply the gas to minute description 2nd plasma occurrence department, the 2nd gas input nine which is established to the minute description 2nd earth conductor and,
In order to supply the gas to minute description 2nd gas input nine with the 2nd gas supply means which is established,
By the gas and the microwave which are supplied to minute description 2nd plasma occurrence department, the low of occurring plasma, the minute description 2nd dielectric board being different, side from end discharge making, the 2nd nozzle for as for under having the microwave plasma processing unit thing with feature.
[claim8]
8. 1st clause to in 7th clause the microwave plasma equipment which recorded to which one clause, about under sharing, arrays the minute description dielectric board and the minute description earth conductor to the side with, plasma of long major axis at the time of occurrence the height atlas the microwave plasma processing unit which composed.
[claim9]
9. 1st clause to in 8th clause the microwave plasma equipment which recorded to which one clause, supplies the mixture of gases of the rare gas or the reactivity gas or the rare gas and the reactivity gas,
Is in the low pressure or intermediate atmospheric pressure or the high atmospheric pressure, plasma at the time of occurrence the height atlas one microwave plasma processing unit.
  • 出願人(英語)
  • NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
  • 発明者(英語)
  • KIM JAEHO
  • SAKAKITA HAJIME
国際特許分類(IPC)
参考情報 (研究プロジェクト等) Innovative Plasma Processing Group, AIST

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