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Processing device for metal material UPDATE_EN

Foreign code F180009587
File No. 2017000348
Posted date Nov 7, 2018
Country China
Application number 201580043271
Gazette No. 107148323
Gazette No. 107148323
Date of filing Aug 11, 2015
Gazette Date Sep 8, 2017
Gazette Date May 29, 2020
International application number JP2015072754
International publication number WO2016024586
Date of international filing Aug 11, 2015
Date of international publication Feb 18, 2016
Priority data
  • P2014-165032 (Aug 13, 2014) JP
  • 2015JP72754 (Aug 11, 2015) WO
Title Processing device for metal material UPDATE_EN
Abstract Provided is a processing device for a metal material, the device comprising: an airtight container that holds a sample therewithin; an oxygen pump that extracts oxygen molecules from a gas discharged from the airtight container; a circulation means that returns the gas to the airtight container; and a plasma generation means that converts the gas returned from the circulation means into plasma and irradiates the sample with the same.
Outline of related art and contending technology BACKGROUND ART
Documents of the prior art
Patent document
Patent document 1: japanese unexamined patent publication No. 2012-144795
Patent document 2: japanese patent laid-open publication No. 2013-80919
Patent document 3: patent specification No. 3921520
Patent document 4: patent specification No. 4621888
Patent document 5: international publication No. 2013/073349
Non-patent document
Non-patent document 1: thin Solid Films 520(2012)2789
Non-patent document 2: Jpn.J.appl.Phys.52(2013)05DB19
Non-patent document 3: mater.res.fill.47 (2012)4107
Scope of claims [claim1]
1. A metal material processing apparatus includes:
a closed container for receiving a sample therein,
an oxygen pump for pumping out oxygen molecules from the gas discharged from the closed vessel,
a circulation means for returning the gas to the closed vessel, and
a plasma generator disposed in the closed container for converting the gas returned from the circulation device into plasma and irradiating the sample,
the plasma device is an atmospheric pressure plasma device used in a closed container under a pressure of 0.1 atmosphere to less than 10 atmospheres,
the atmospheric pressure plasma device comprises a voltage applying device (43) and a pipe (42), wherein electrodes (41a, 41b) facing each other are provided near the outlet of the pipe (42), and a plasma (44) generated between the two electrodes is blown to a sample by a gas flow discharged from the outlet of the pipe (42), or
The atmospheric pressure plasma device has a high-frequency high-voltage applying device at a position different from the discharge port of the pipe (42), and has a structure in which plasma generated by electromagnetic induction is blown to the sample by an air flow,
further, the metal material treatment apparatus has a closed loop structure for returning the discharged gas to the oxygen pump again.

[claim2]
2. A metal material processing apparatus includes:
a closed container for receiving a sample therein,
an oxygen pump for pumping out oxygen molecules from the gas discharged from the closed vessel,
a circulation means for returning the gas to the closed vessel,
a heater for heating the gas returned from the circulation device, and
a plasma generator disposed in the closed container for converting the gas returned from the circulation device into plasma and irradiating the sample,
the plasma device is an atmospheric pressure plasma device used in a closed container under a pressure of 0.1 atmosphere to less than 10 atmospheres,
the atmospheric pressure plasma device comprises a voltage applying device (43) and a pipe (42), wherein electrodes (41a, 41b) facing each other are provided near the outlet of the pipe (42), and a plasma (44) generated between the two electrodes is blown to a sample by a gas flow discharged from the outlet of the pipe (42), or
The atmospheric pressure plasma device has a high-frequency high-voltage applying device at a position different from the discharge port of the pipe (42), and has a structure in which plasma generated by electromagnetic induction is blown to the sample by an air flow,
further, the metal material treatment apparatus has a closed loop structure for returning the discharged gas to the oxygen pump again.

[claim3]
3. The apparatus according to claim 1 or 2, wherein a sample stage for holding the sample is provided in the closed vessel.

[claim4]
4. The apparatus according to claim 3, wherein the sample stage is provided with a heater for heating the sample.

[claim5]
5. The apparatus of claim 1 or 2, wherein said recycling means returns the gas exhausted from said closed vessel to the closed vessel under pressure.

[claim6]
6. The apparatus according to claim 1 or 2, wherein the metal material is a fine particle of a metal or a metal compound.

[claim7]
7. The apparatus according to claim 1 or 2, wherein the metal material can be sintered and reduced, or sintered or reduced.

[claim8]
8. The apparatus according to claim 1 or 2, wherein the metal constituting the metal material is copper.

[claim9]
9. The apparatus according to claim 1 or 2, wherein the gas contains nitrogen.

[claim10]
10. The apparatus according to claim 1 or 2, wherein the partial pressure of oxygen in the gas returned to the closed vessel is 10-25Below atmospheric pressure.

[claim11]
11. The device according to claim 1 or 2, wherein the oxygen pump has a solid electrolyte body having oxygen ion conductivity and electrodes disposed on the inner and outer sides thereof.

[claim12]
12. The apparatus according to claim 11, wherein the solid electrolyte body is made of stabilized zirconia.

[claim13]
13. The device according to claim 11, wherein the electrode is a porous electrode provided along a surface of the solid electrolyte body.
  • Applicant
  • NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST
  • Inventor
  • SHIRAKAWA NAOKI
  • MURATA KAZUHIRO
IPC(International Patent Classification)
Reference ( R and D project ) Flexible Electronics Research Center, AIST

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