TOP > 外国特許検索 > METHOD FOR PRODUCING SURFACE-MODIFIED SUBSTRATE, METHOD FOR PRODUCING CONJUGATE, NOVEL HYDROSILANE COMPOUND, SURFACE TREATMENT AGENT, SURFACE TREATMENT AGENT KIT, AND SURFACE-MODIFIED SUBSTRATE

METHOD FOR PRODUCING SURFACE-MODIFIED SUBSTRATE, METHOD FOR PRODUCING CONJUGATE, NOVEL HYDROSILANE COMPOUND, SURFACE TREATMENT AGENT, SURFACE TREATMENT AGENT KIT, AND SURFACE-MODIFIED SUBSTRATE NEW

外国特許コード F180009652
整理番号 4423
掲載日 2018年11月21日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2015JP001277
国際公開番号 WO2015136913
国際出願日 平成27年3月9日(2015.3.9)
国際公開日 平成27年9月17日(2015.9.17)
優先権データ
  • 特願2014-046102 (2014.3.10) JP
  • 特願2014-266211 (2014.12.26) JP
発明の名称 (英語) METHOD FOR PRODUCING SURFACE-MODIFIED SUBSTRATE, METHOD FOR PRODUCING CONJUGATE, NOVEL HYDROSILANE COMPOUND, SURFACE TREATMENT AGENT, SURFACE TREATMENT AGENT KIT, AND SURFACE-MODIFIED SUBSTRATE NEW
発明の概要(英語) This method for producing a surface-modified substrate includes a step for bringing into contact, in the presence of a borane catalyst, a substrate having polar groups present on the surface thereof and a hydrosilane compound having an Si-H group in which a hydrogen atom is bonded to a silicon atom of molecular structure A, and causing a dehydrocondensation reaction to advance between the substrate and the compound, thereby forming a substrate having a surface modified by molecular structure A. This production process makes it possible to modify the substrate surface in a shorter time and at a lower temperature than in the past, and provides a high degree of freedom in terms of the shape, type, and use of the substrate, the form of the modification reaction, the type of molecular structure used to modify the substrate surface, and the like.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • KYOTO UNIVERSITY
  • 発明者(英語)
  • NAKANISHI, Kazuki
  • MOITRA, Nirmalya
  • KANAMORI, Kazuyoshi
  • SHIMADA, Toyoshi
国際特許分類(IPC)
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