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IMPLANT INSTALLATION STRENGTH EVALUATION METHOD, IMPLANT INSTALLATION STRENGTH EVALUATION DEVICE, AND PROGRAM NEW 新技術説明会

外国特許コード F190009807
整理番号 (Q20041JP)
掲載日 2019年5月8日
出願国 世界知的所有権機関(WIPO)
国際出願番号 2018JP033978
国際公開番号 WO 2019054442
国際出願日 平成30年9月13日(2018.9.13)
国際公開日 平成31年3月21日(2019.3.21)
優先権データ
  • 特願2017-177109 (2017.9.14) JP
発明の名称 (英語) IMPLANT INSTALLATION STRENGTH EVALUATION METHOD, IMPLANT INSTALLATION STRENGTH EVALUATION DEVICE, AND PROGRAM NEW 新技術説明会
発明の概要(英語) This implant installation strength evaluation method has: a step for vibrating an implant; a step for measuring time-series data on the vibration frequency and vibration strength of the implant vibrated in the step for vibrating the implant; and a step for deriving information indicating an index of the installation strength of the implant on the basis of the time-series data on the vibration frequency and vibration strength of the implant.
従来技術、競合技術の概要(英語) BACKGROUND ART
Such as an artificial joint implant in a human bone and the implant treatment of the application is installed, the installation strength of the implant, the operating surgeon in the sense of a large part is determined. Deployment of the intensity is not sufficient, and the loosening of the implant in the future without departing from the leads. The intensity of the installation of the implant, in the research stage, out of an operation, a pulling force or torque by a destructive inspection by the embedded, is often evaluated.
On the other hand, the dental implant treatment in the treatments applicable to the evaluation technique, using magnetic resonance frequency is measured by a known technique (for example, see Patent Document 1) respectively. In addition, such as a diagnosis image of the implant in the X-ray and to post-treatments are used in combination. The image diagnosis, confirmation of the installation position of the implant are mainly used. An image combining the computer analysis and diagnosis of the implant known technique to evaluate the strength of fixing (for example, see Patent Document 2) respectively.
  • 出願人(英語)
  • ※2012年7月以前掲載分については米国以外のすべての指定国
  • KEIO UNIVERSITY
  • NATIONAL INSTITUTES FOR QUANTUM AND RADIOLOGICAL SCIENCE AND TECHNOLOGY
  • INSTITUTE FOR LASER TECHNOLOGY
  • 発明者(英語)
  • NAKAJIMA DAISUKE
  • Noboru Hasegawa
国際特許分類(IPC)
指定国 National States: AE AG AL AM AO AT AU AZ BA BB BG BH BN BR BW BY BZ CA CH CL CN CO CR CU CZ DE DJ DK DM DO DZ EC EE EG ES FI GB GD GE GH GM GT HN HR HU ID IL IN IR IS JO JP KE KG KH KN KP KR KW KZ LA LC LK LR LS LU LY MA MD ME MG MK MN MW MX MY MZ NA NG NI NO NZ OM PA PE PG PH PL PT QA RO RS RU RW SA SC SD SE SG SK SL SM ST SV SY TH TJ TM TN TR TT TZ UA UG US UZ VC VN ZA ZM ZW
ARIPO: BW GH GM KE LR LS MW MZ NA RW SD SL SZ TZ UG ZM ZW
EAPO: AM AZ BY KG KZ RU TJ TM
EPO: AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
OAPI: BF BJ CF CG CI CM GA GN GQ GW KM ML MR NE SN ST TD TG

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