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g-C3N4 FILM NEW_EN

Foreign code F190009915
File No. 08105-US
Posted date Aug 26, 2019
Country United States of America
Application number 201314653641
Gazette No. 20150352539
Gazette No. 10252253
Date of filing Dec 24, 2013
Gazette Date Dec 10, 2015
Gazette Date Apr 9, 2019
International application number JP2013084543
International publication number WO2014098251
Date of international filing Dec 24, 2013
Date of international publication Jun 26, 2014
Priority data
  • P2012-280283 (Dec 21, 2012) JP
Title g-C3N4 FILM NEW_EN
Abstract In order to provide g-C3N4 capable of being simply and easily handled, a g-C3N4 film is produced by heating, as a starting material, a compound represented by X+mYm-, wherein X+ is a guanidium ion or the like ion, and Ym- is an anion, to vaporize the compound or its reactant, and depositing the compound or the reactant over a surface of a base material heated, the surface carrying negative electric charges or having .pi. electrons, so that the compound or the reactant is polymerized on the base material to generate g-C3N4.
  • Inventor, and Inventor/Applicant
  • Kawamoto; Masuki
  • Arazoe; Hiroki
  • Akaike; Kouki
  • Koizumi; Yoshiko
  • Aida; Takuzo
  • Miyajima; Daigo
  • RIKEN
IPC(International Patent Classification)

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