|発明の名称||THIN FILM DEPOSITION DEVICE AND THIN FILM DEPOSITION METHOD|
PROBLEM TO BE SOLVED: To correctly measure the physical property value (such as film thickness) of a thin film deposited on a substrate in real time even in a state where a rotary drum is rotated at high speed.
SOLUTION: In the thin film deposition device 1, a rotary encoder 100 for detecting the rotary position of a substrate S is fitted to the rotary axis of a rotary drum 13, and, on the basis of the rotary position of the substrate S detected by the rotary encoder 100, a measurement control computer 96 controls timing to perform the measurement of its film physical property value by an optical measuring means 80. In this way, even to a substrate lying at a prescribed rotary position, the measurement of its physical property value is made possible for each rotation of the substrate, thus, even when the position of the substrate is varied by the rotation of the rotary drum 13, the film physical property value can be always measured on the basis of the measurement light emitted at the same incident angle to the same position in the same substrate.
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