|発明の名称||METHOD FOR MANUFACTURING TWO-DIMENSIOAL PHOTONIC CRYSTAL|
PROBLEM TO BE SOLVED: To provide a method for manufacturing a two-dimensioal photonic crystal by which the resonance wavelength of a point defect resonator is easily controlled.
SOLUTION: The two-dimensioal photonic crystal is provided with a hole 12 arranged in a triangular grid shape on a slab 11 composed of Si and with a point defect resonator 13 ((a-1)-(a-4)). Then, the surface of the slab 11 is exposed to water (b), with an oxidized film 16 formed on this surface (c). Thereafter, the oxidized film 16 is removed (e) by exposing the surface to hydrofluoric acid (d). By performing (b)-(e) operations (unit thinning process), the thickness of the slab 11 is reduced by about 0.11 nm, which varies the resonance wavelength of the point defect resonator 13 to shorter wavelength by 0.39 nm (if designed for 1.55 μm band). Repeating the unit thinning process can control the resonance wavelength with the precision of 0.39 nm per process.
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